sputtering system造句
例句与造句
- Research of unbalanced magnetron sputtering system
非平衡磁控溅射系统的研究 - Planar magnetron sputtering system
平面磁控管溅镀系统 - Dc diode sputtering system
直流二极管溅镀系统 - Magnetron sputtering system
磁控管溅镀系统 - Reactive sputtering system
反应性溅镀系统 - It's difficult to find sputtering system in a sentence. 用sputtering system造句挺难的
- Ion beam sputtering system
离子束溅镀系统 - Cu - fe thin films were fabricated by a direction - current ( dc ) magnetron sputtering system
本文首先采用直流磁控溅射镀膜方法制备了cu - fe过饱和固溶体薄膜。 - Compound medium wave - guide film on columned li - ferrites was made by magnetron sputtering system
用磁控溅射的方法在圆柱锂铁氧体表面镀覆了复合介质波导薄膜。 - Boron nitride ( bn ) thin films were deposited on si substrates using the conventional radio - frequency ( rf ) sputtering system , with hexagonal boron nitride ( hbn ) target and working gas of argon ( or mixture of nitrogen and argon )
使用射频溅射( rf )系统,靶材为烧结的六角氮化硼( hbn ) ,工作气体为氩气(或氩气和氮气的混合气) ,在硅衬底上沉积氮化硼薄膜。 - Study on the fabricating method the fe / al2o3 / fe mtj and co / al2o3 / feni mtj are prepared by ion - beam sputtering systems . the fexcu ( 1 - x ) granule films were evaporated directly using a high vacuum electron beam evaporation . some samples of granule films are annealed at 340c
用高真空镀膜机制备了fe _ xcu _ ( ( 1 - x ) )系列颗粒膜，并对部分膜做了加热退火处理，样品被加热到340并且保温2小时。 - For example , the silicon is etched anisotropically in the koh solution , the lucent al film is made with the magnetron sputtering system , the pressure hole is drilled by the supersonic stiletto machine and the silicon and the glass are bonded with electrostatic bonding setup
例如， koh溶液对硅的各向异性腐蚀，磁控溅射台制作光亮的铝膜，超声打孔机制作导压孔，静电键合装置对硅岛膜与玻璃极板的阳极封接等等。 - Tantalum oxide films were prepared by self - assembled middle frequency a . c . sputtering system . the contents and microstructure of the films were studies as the functions of oxygen percentage in sputtering gases and substrate temperature
论文采用自行组装的中频交流磁控溅射设备制备了氧化钽薄膜，考察了溅射气体中氧气含量、基底温度等对薄膜成分、结构的影响，并且通过优化工艺参数得到了接近化学计量比的氧化钽薄膜。 - In order to fabricate excellent electro - optic materials , this paper focused on the choice of electro - optic materials , the fabrication of ceramics target , developing new rf magnetron sputtering system , and the preparation of the electro - optic film , etc . the following results were obtained
本文围绕制备性能优异的电光材料,从电光材料的选择、材料配比、靶材制备、射频磁控溅射镀膜设备的研制、电光薄膜材料制作等方面进行了研究。 - In this study we focused on the pinning structure , and prepared [ pt / mn ] n multilayer by dc magnetron sputtering system instead of using co - sputtering , by which we wish to find a way to reduce the critical annealing temperature and shorten the annealing time
在我们的课题研究中，我们着重对钉扎层进行了研究，工艺上采用了pt / mn多层膜而不是传统的共溅射的方法。我们希望通过这种方式能够发现一条降低临界退火温度的途径，并且能够缩短退火时间。 - Secondly , we have studied the properties of the conbzr high frequency soft - magnetic thin film , and use the dc magnetron sputtering system by conquering the key technology to fabricate double - sides thin - film inductors on 10mm * 10mm printed circuit board and 20mm * 20mm ceramic board
再次，研究了薄膜电感所使用的conbzr高频软磁薄膜材料的性能，并利用真空磁控溅射设备，克服各种关键技术及工艺难度，在10mm 10mm的pcb板、 20mm 20mm陶瓷基片上制作了薄膜电感。
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